Patent · US Active

Functional nanoparticles

US8961800B2 · kind B2 · utility

4Cited by
14References
27Claims
0Family size

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Key dates

Filing dateAug 11, 2010
Grant dateFeb 24, 2015
Priority date
Expiry dateNov 17, 2031

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y30/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.