Resin systems for dental restorative materials and methods using same
US8962709B2 · kind B2 · utility
9Cited by
10References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 7, 2013 |
| Grant date | Feb 24, 2015 |
| Priority date | — |
| Expiry date | Jan 7, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D4/00
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
The invention includes a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. The system of the invention has enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.