Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist
US8968987B2 · kind B2 · utility
2Cited by
9References
6Claims
0Family size
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Key dates
| Filing date | Jan 11, 2012 |
| Grant date | Mar 3, 2015 |
| Priority date | — |
| Expiry date | Apr 16, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/107
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.