Patent · US Active

Zero-order diffractive filter and method for manufacturing thereof

US8970955B2 · kind B2 · utility

0Cited by

1References

12Claims

0Family size

Assignee

CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA—RECHERCHE ET DÉVELOPPEMENT · CH

Inventors

Harald Walter · Horgen, CH
Alexander Stuck · Wettingen, CH

Key dates

Filing date	Jun 15, 2010
Grant date	Mar 3, 2015
Priority date	—
Expiry date	Mar 16, 2031

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB42D25/328
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present invention discloses a method for manufacturing a zero-order diffractive filter comprising a high-index material having an upper surface and a lower surface. The high-index material is positioned between a first low-index matter and a second low-index matter; the lower surface is adjacent to said first low-index matter and the upper surface is adjacent to the second low-index matter. Moreover, the high-index material has an index of refraction that is higher than the index of refraction of both said first low-index matter and said second low-index matter. The method comprises at least the following procedure: selectively providing, by employing at least one wet-coating technique, at least one of the following at least partially: the high-index material onto said first low-index matter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.