Process for producing glass substrate provided with aluminum oxide-containing silicon oxide film
US8973403B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2012 |
| Grant date | Mar 10, 2015 |
| Priority date | — |
| Expiry date | Jun 14, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/113
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane and an organic aluminum complex to a glass substrate within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass substrate, and a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane and an organic aluminum complex is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass ribbon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.