Patent · US Active

Device for treating gases using surface plasma

US8974741B2 · kind B2 · utility

0Cited by

2References

13Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Laurent Bedel · Bar-le-Duc, FR
Michel Jouve · Vinay, FR

Key dates

Filing date	Oct 24, 2013
Grant date	Mar 10, 2015
Priority date	—
Expiry date	Oct 24, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02C20/10
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A device for treating gases using surface plasma, including: at least one dielectric substrate having two opposite main surfaces, at least one first electrode, and at least one second electrode being respectively deposited on the two opposite main surfaces of the substrate, the first and second electrodes being connected to the two terminals of an electric power supply source; at least one catalytic support independent from the dielectric substrate and from the electrodes, and integrating a catalyst.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.