Process for producing glass substrate provided with inorganic fine particle-containing silicon oxide film
US8978416B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2012 |
| Grant date | Mar 17, 2015 |
| Priority date | — |
| Expiry date | May 12, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2217/479
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane having an exothermic peak temperature of at most 500° C. and inorganic fine particles to a glass substrate within a temperature range of from 400 to 650° C., or a process for producing a glass substrate, comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane having an exothermic peak temperature of at most 500° C. and inorganic fine particles is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.