Patent · US Active

PVD hybrid method for depositing mixed crystal layers

US8980446B2 · kind B2 · utility

1Cited by

6References

14Claims

0Family size

Assignee

WALTER AG · DE

Inventors

Wolfgang Engelhart · Metzingen, DE
Veit Schier · Echterdingen, DE

Key dates

Filing date	May 3, 2011
Grant date	Mar 17, 2015
Priority date	—
Expiry date	Oct 22, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/12972
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods, which gives mixed crystal layers which are as free as possible of macroparticles (droplets) and which have a proportion as high as possible of a desired crystalline phase and which are highly crystalline, it is proposed according to the invention that deposition of the mixed crystal layer is effected with simultaneous application of i) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering and ii) arc vapour deposition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.