Photoresist composition and method of forming a black matrix using the same
US8980528B2 · kind B2 · utility
2Cited by
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12Claims
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Key dates
| Filing date | Feb 12, 2013 |
| Grant date | Mar 17, 2015 |
| Priority date | — |
| Expiry date | Feb 12, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2051
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.