System and method for measuring X-ray beam profile using an area detector
US8983165B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 23, 2011 |
| Grant date | Mar 17, 2015 |
| Priority date | — |
| Expiry date | Dec 15, 2033 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N2005/1061
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The claimed subject matter describes a novel technique to measure the beam profile using an area detector. In one embodiment, a set of one-dimensional beam profile measurements is performed by taking two images under the same source conditions but at two different positions of the detector, with each position of the detector shifted by a certain distance in the direction corresponding to the direction of the one-dimensional profile measurement. In further embodiments, a set of two-dimensional beam profile measurements is achieved by determining a second set of one-dimensional profiles from the same sampling points in a second direction and building a two-dimensional map of the beam profile by correlating the first one-dimensional profile measurement with the second one-dimensional profile measurement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.