Method for coating a substrate in a vacuum chamber having a rotating magnetron

US8992742B2 · kind B2 · utility

Assignee

• VON ARDENNE Anlagentechnik GmbH · DE

Inventors

• Volker Linss · Jena, DE
• Tilo Wuensche · Dresden, DE

Key dates

• Filing date: Jun 28, 2010
• Grant date: Mar 31, 2015
• Expiry date: Sep 11, 2030

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/54
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In a method for coating a substrate in a vacuum chamber having a rotating magnetron, wherein a substrate is guided past the magnetron in a substrate transport direction and is coated by a material, which has been isolated from a target connected to the magnetron, and, optionally with the material reacting with a reactive gas present in the vacuum chamber, homogeneity of the coating layer on a substrate is improved by stabilizing the working point by way of the target rotation. This is achieved in that a periodic change of a first process parameter caused by the target revolution is compensated for by a periodic change of a second process parameter having a determined level and/or by employing two magnetrons having different rotational speeds.