Optical device for observing millimetric or submillimetric structural details of an object with specular behaviour
US8994956B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 29, 2008 |
| Grant date | Mar 31, 2015 |
| Priority date | — |
| Expiry date | Jan 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device for observation, by reflection, of the structural details of an object (2) that exhibits a behavior that is at least partially specular, located in an exposure area, which includes: at least one radiation source with an emission surface (6) possessing at least two distinct zones (26, 27) emitting streams of radiation, where at least one of the characteristics differs from one zone to the next; an optical projection system that is located in line with the radiation source in relation to the exposure zone, in the path of the radiation; an optical exposure system (18) designed to optically link the entry aperture (14) of the optical projection system and the emission surface (6); a projection surface (10) that is linked optically with the object in the exposure zone, and whose received radiation depends on the deflection on the object (2).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.