Medical electrode including an iridium oxide surface and methods of fabrication
US8996129B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 31, 2007 |
| Grant date | Mar 31, 2015 |
| Priority date | — |
| Expiry date | Jan 17, 2030 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B2562/125
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An implantable medical electrode includes a substrate and an iridium oxide surface, which is formed by an iridium oxide film applied over a roughened surface of the substrate. The film is preferably applied via direct current magnetron sputtering in a sputtering atmosphere comprising argon and oxygen. A sputtering target power may be between approximately 80 watts and approximately 300 watts, and a total sputtering pressure may be between approximately 9 millitorr and approximately 20 millitorr. The iridium oxide film may have a thickness greater than or equal to approximately 15,000 angstroms and have a microstructure exhibiting a columnar growth pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.