Method for producing cleaning water for an electronic material
US8999069B2 · kind B2 · utility
4Cited by
3References
3Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 25, 2009 |
| Grant date | Apr 7, 2015 |
| Priority date | — |
| Expiry date | Jul 19, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for producing cleaning water for an electronic material, includes obtaining oxygen gas and argon gas from air with a PSA oxygen concentration apparatus, dissolving the oxygen gas and argon gas obtained from the PSA oxygen concentration apparatus in pure water or ultrapure water. A concentration of dissolved oxygen is in a range of 8 to 50 mg/L, and a content of dissolved argon gas is in a range of 2 to 50 volume % of a total amount of dissolved oxygen gas and the dissolved argon gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.