Insulator interposed type plasma processing apparatus
US8999122B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 10, 2010 |
| Grant date | Apr 7, 2015 |
| Priority date | — |
| Expiry date | Dec 25, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32871
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Electrically charged droplets and neutral droplets mixed with plasma are removed with better efficiency, and an improvement in the surface treatment precision of film formation by high purity plasma is sought.In a plasma processing apparatus including plasma generating portion A, plasma transport tube B and plasma processing portion C, an insulator interposed plasma processing apparatus is constituted in which plasma transport tube B is made electrically independent from plasma generating portion A and plasma processing portion C electrically by interposing insulator IS and insulator IF between the starting end side and the finishing end side of the plasma transport tube. Plasma transport tube B is divided into multiple small transport tubes B01, B23 through intermediate insulator II1, and each small transport tube is made independent electrically. The electric potential of the plasma transport tube or the small transport tubes is set to GND, a variable positive electric potential, or a variable negative electric potential, by putting the plasma transport tube or the multiple small transport tubes in an electric floating state, or connecting bias power supplies EB 01, EB 23 for tra…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.