Methods for formation of substrate elements
US8999851B2 · kind B2 · utility
2Cited by
27References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2008 |
| Grant date | Apr 7, 2015 |
| Priority date | — |
| Expiry date | Nov 10, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/121
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.