Patent · US Active

Ultra-large size flat panel display maskless photolithography system and method

US9001305B2 · kind B2 · utility

1Cited by

12References

23Claims

0Family size

Inventors

Wenhui Mei · Plano, US
Weichong Du · Burnaby, CA
Lujie Qu · Nanhu, CN

Key dates

Filing date	Oct 10, 2012
Grant date	Apr 7, 2015
Priority date	—
Expiry date	Sep 6, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70791
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.