Patent · US Active

Process for producing liquid ejection head

US9003620B2 · kind B2 · utility

1Cited by
8References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 12, 2013
Grant dateApr 14, 2015
Priority date
Expiry dateNov 21, 2033

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49401
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A process for producing a liquid ejection head having a piezoelectric body provided with an ejection orifice for ejecting liquid and a pressure chamber communicating therewith for retaining the liquid, wherein an electrode is formed on an inner wall surface of the pressure chamber to deform the pressure chamber by piezoelectric action caused by applying voltage to the electrode to eject the liquid, comprising providing the piezoelectric body in which a surface thereof having the ejection orifice has an arithmetic mean roughness of 0.1-1 μm, forming a dry film resist pattern on the surface of the piezoelectric body so as to expose the ejection orifice and a linear region connected thereto, and forming a metal thin film pattern being connected to the electrode on the inner wall surface and continuously extending from the inner wall surface to the linear region by using the dry film resist pattern as a mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.