Organoaminosilane precursors and methods for making and using same
US9005719B2 · kind B2 · utility
4Cited by
0References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 30, 2014 |
| Grant date | Apr 14, 2015 |
| Priority date | — |
| Expiry date | May 30, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0228
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described herein are organoaminosilane precursors which can be used to deposit silicon containing films which contain silicon and methods for making these precursors. Also disclosed herein are deposition methods for making silicon-containing films or silicon containing films using the organoaminosilane precursors described herein. Also disclosed herein are the vessels that comprise the organoaminosilane precursors or a composition thereof that can be used, for example, to deliver the precursor to a reactor in order to deposit a silicon-containing film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.