Photosensitive alkali-soluble resin, method of preparing the same, and color photosensitive resist containing the same
US9006352B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 15, 2013 |
| Grant date | Apr 14, 2015 |
| Priority date | — |
| Expiry date | Aug 15, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/306
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Provided is a photosensitive alkali-soluble resin comprising a compound of formula (I), a method of preparing the same, and a color photosensitive resist containing the same, wherein n1, n2, R1, R2 and R3 are defined as herein. The photosensitive alkali-soluble resin is prepared by: copolymerizing ethylene oxide with α-hydroxyalkyl phenyl ketone to obtain the first intermediate product, followed by copolymerizing the first intermediate product with a copolymerization product of glycerin acrylate, styrene, and maleic anhydride to obtain the second intermediate product, and oxidizing the second intermediate product to produce the photosensitive alkali-soluble resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.