High-voltage trench junction barrier Schottky diode
US9006858B2 · kind B2 · utility
2Cited by
3References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 12, 2012 |
| Grant date | Apr 14, 2015 |
| Priority date | — |
| Expiry date | Nov 12, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/64
Abstract
In a Schottky diode having an n+-type substrate, an n-type epitaxial layer, at least two p-doped trenches introduced into the n-type epitaxial layer, mesa regions between adjacent trenches, a metal layer functioning as a cathode electrode, and another metal layer functioning as an anode electrode, the thickness of the epitaxial layer is more than four times the depth of the trenches.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.