Systems and methods for using double mask techniques to achieve very small features
US9007719B1 · kind B1 · utility
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19Claims
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Key dates
| Filing date | Mar 31, 2014 |
| Grant date | Apr 14, 2015 |
| Priority date | — |
| Expiry date | Mar 31, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3116
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
System and methods are provided for the manufacture of a magnetic write head including a pole and yoke region, and a nose shape transition region connecting the yoke to the pole having very small minimum radius of curvature, providing for a sharp transition. A double mask technique is used providing for the adjustment of an offset and illumination conditions between the first and second mask, which provides the capability of tuning the shape of the transition region, and achieving features that would otherwise not be achievable due to distortions caused by optical proximity effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.