Alignment of single-mode polymer waveguide (PWG) array and silicon waveguide (SiWG) array for providing adiabatic coupling
US9008477B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 7, 2013 |
| Grant date | Apr 14, 2015 |
| Priority date | — |
| Expiry date | Oct 7, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/24
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Alignment of a single-mode polymer waveguide (PWG) array fabricated on a polymer with a silicon waveguide (SiWG) array fabricated on a silicon (Si) chip and thereby realizing an adiabatic coupling. A stub and a groove are fabricated with high precision and made to function as the absolute positioning reference to provide a self-alignment according to the groove and the stub. In a PWG patterning by photolithography, plural masks are used, but the fabrication is made along the alignment base line for mask and thus a high precision is achieved with respect to error δx. In a PWG patterning by nano imprint, a high precision in the fabrication is also achieved with respect to error δx and δy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.