Patent · US Active

Compositions and antireflective coatings for photolithography

US9011591B2 · kind B2 · utility

1Cited by

14References

19Claims

0Family size

Assignees

DOW GLOBAL TECHNOLOGIES LLC · US
Rohm and Haas Electronic Materials LLC · US

Inventors

Yuanqiao Rao · Pittsford, US
Robert L. Auger · Midland, US
John D. Weaver · Lake Jackson, US
Paul J. Popa · Auburn, US
Roxanne M. Jenkins · Missouri City, US
Christopher P. Sullivan · Halifax, US
Jessica P. Evans · Freeport, US
Cecilia W. Kiarie · Marlborough, US
Yasmin N. Srivastava · Rua Engenheiro Marcondes Ferraz, US
Jeffrey L. Fenton, JR. · Lake Jackson, US

Key dates

Filing date	Aug 28, 2012
Grant date	Apr 21, 2015
Priority date	—
Expiry date	Oct 18, 2032

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31663
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Compositions for use in microelectronic applications: R10, R11, R12, R13 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.