Method of forming a polymer substrate with variable refractive index sensitivity
US9011705B2 · kind B2 · utility
1Cited by
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18Claims
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Key dates
| Filing date | Jul 26, 2012 |
| Grant date | Apr 21, 2015 |
| Priority date | — |
| Expiry date | Jul 26, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24331
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to a method of forming polymer substrate with variable refractive index sensitivity, the method comprising the steps of: (a) contacting a metal-coated patterned mold with a polymer substrate at a temperature sufficient to deform said polymer substrate to thereby deposit a patterned mask of a metal film on the polymer substrate; and (b) etching away portions of said polymer substrate not covered by said patterned mask under conditions to form a region of variable refractive index sensitivity on said polymer substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.