Composition and method for preparing pattern on a substrate
US9012545B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Aug 31, 2012 |
| Grant date | Apr 21, 2015 |
| Priority date | — |
| Expiry date | Apr 12, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.