Patent · US Active

Electro chemical deposition and replenishment apparatus

US9017528B2 · kind B2 · utility

6Cited by
67References
44Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 12, 2012
Grant dateApr 28, 2015
Priority date
Expiry dateDec 17, 2032

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D17/06
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process electrolyte replenishment module adapted to replenish ions in a process electrolyte in a substrate electrochemical deposition apparatus having a first anode and a first cathode, the replenishment module having a second anode. A process electrolyte recirculation compartment is disposed in the frame configured so that the process electrolyte is recirculating between the replenishment module and the deposition apparatus. An anode compartment is coupled to the process electrolyte recirculation compartment having the second anode, that is a soluble anode, for immersion in a secondary anolyte, and having a first ion exchange membrane being a cationic member separating the secondary anolyte from the process electrolyte. A cathode compartment is provided in the frame coupled to the process electrolyte recirculation compartment having a second cathode for immersion in a secondary catholyte, and having a second ion exchange membrane being a monovalent selective membrane separating the secondary catholyte from the process electrolyte.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.