Method and system for double patterning technology (DPT) odd loop visualization for an integrated circuit layout
US9026958B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2013 |
| Grant date | May 5, 2015 |
| Priority date | — |
| Expiry date | Mar 11, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Computer-implemented method, system and computer program product for double patterning technology (DPT) odd loops visualization within an integrated circuit design layout are disclosed. The method, system and computer program product comprise mapping all violations of the integrated circuit design layout to a graph. The method, system and computer programming product also includes partitioning the graph into a plurality of sub-graphs. Each of the plurality of sub-graphs includes multiple edges and multiple nodes. The method, system and computer product further include detecting all possible odd loops in each of the plurality of sub-graphs; and visualizing all of the odd loops in at least one of the plurality of sub-graphs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.