Patent · US Active

Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

US9028242B2 · kind B2 · utility

0Cited by

8References

12Claims

0Family size

Assignee

Smoltek AB · SE

Inventors

Amin Saleem Muhammad · Handen, SE
David Brud · Alvesta, SE
Jonas S. T. Berg · Hyssna, SE
Mohammad Shafiqul Kabir · Gothenburg, SE
Vincent Desmaris · Gothenburg, SE

Key dates

Filing date	Jul 23, 2009
Grant date	May 12, 2015
Priority date	—
Expiry date	Dec 14, 2030

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S977/932
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

Template and method of making high aspect ratio template, stamp, and imprinting at nanoscale using nanostructures for the purpose of lithography, and to the use of the template to create perforations on materials and products.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.