Artificial silica marble having amorphous patterns and method for preparing the same
US9029436B2 · kind B2 · utility
25Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2013 |
| Grant date | May 12, 2015 |
| Priority date | — |
| Expiry date | Oct 31, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2111/545
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An artificial silica marble comprises a matrix and a line pattern portion. The line pattern portion comprises fine lines having a width of about 50 to about 500 μm and forms a web- or net-like pattern. The line pattern portion divides or partitions the artificial silica marble into a plurality of irregularly shaped pattern portions to form an amorphous pattern in the cross section of the artificial silica marble.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.