Patent · US Active

Plasma-based photon source, ion source, and related systems and methods

US9029797B2 · kind B2 · utility

1Cited by
5References
18Claims
0Family size

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Key dates

Filing dateJul 25, 2013
Grant dateMay 12, 2015
Priority date
Expiry dateJul 25, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J49/162
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.