Patent · US Active

Storage material and method for obtaining H-silanes therefrom

US9034291B2 · kind B2 · utility

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22Claims
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Key dates

Filing dateJun 30, 2011
Grant dateMay 19, 2015
Priority date
Expiry dateDec 31, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S502/526
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A storage material for obtaining H-silanes which is present in the form of a hydrogenated polysilane (HPS), as a pure compound or as a mixture of compounds having on average at least six direct Si—Si bonds, the substituenis of which predominantly consist of hydrogen and in the composition of which the atomic ratio of sabstitueot to silicon is at least 1:1.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.