Patent · US Active

Manufacturing methods for semiconductor devices

US9034686B2 · kind B2 · utility

2Cited by
5References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 29, 2012
Grant dateMay 19, 2015
Priority date
Expiry dateSep 4, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

Embodiments of the present invention include a method. The method includes heating a layer stack. The layer stack includes a first layer comprising cadmium and tin, a metal layer disposed over the first layer, and a window layer disposed over the metal layer. Heating the stack includes transforming at least a portion of the first layer from an amorphous phase to a crystalline phase. Heating may be performed using any of various configurations, such as, for example, heating an individual stack, or using a face-to-face configuration of multiple stacks. The stack may be used for fabricating a photovoltaic device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.