Patent · US Active

Multi-beam system for high throughput EBI

US9035249B1 · kind B1 · utility

36Cited by

17References

20Claims

0Family size

Assignee

ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · DE

Inventors

Jürgen Frosien · Riemerling, DE
Dieter Winkler · Munich, DE
Benjamin John Cook · Munich, DE

Key dates

Filing date	Feb 6, 2014
Grant date	May 19, 2015
Priority date	—
Expiry date	Feb 6, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.