Patent · US Active

Enclosed polishing apparatus

US9039492B2 · kind B2 · utility

0Cited by
5References
20Claims
0Family size

Assignees

Inventors

Key dates

Filing dateJan 30, 2013
Grant dateMay 26, 2015
Priority date
Expiry dateMay 6, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B47/12
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

An enclosed polishing apparatus include a housing, a fixing seat, a guiding mechanism, and a chain-driven polishing mechanism. The housing includes a bottom housing and a top housing connected to the bottom housing. The fixing seat is securely placed in the bottom housing. The guiding mechanism is placed in the top housing above the fixing seat. The polishing mechanism is movably mounted on the guiding mechanism above the fixing seat. The polishing mechanism is driven and guided by the guiding mechanism to follow a desired polishing contour on a workpiece.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.