Method for producing an antireflection coating

US9039906B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Ulrike Schulz · Jena, DE
• Peter Munzert · Jena, DE
• Friedrich Rickelt · Jena, DE
• Norbert Kaiser · Markt Taschendorf, DE

Key dates

• Filing date: Jun 19, 2014
• Grant date: May 26, 2015
• Expiry date: Jun 19, 2034

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B29C2059/147
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process.