In situ oxide removal, dispersal and drying for copper copper-oxide
US9039916B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 6, 2010 |
| Grant date | May 26, 2015 |
| Priority date | — |
| Expiry date | Oct 1, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2916
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for removing copper-oxide from copper powder, the method comprising: providing a copper powder defined by each particle having a copper core and a copper-oxide layer surrounding the copper core; disposing the particles in an etching solution in a container, wherein the etching solution removes the copper-oxide layer from each particle; decanting the etching solution and by-products; washing the particles; disposing the washed particles in an organic solvent; coating each copper core with an organic material from the organic solvent; dispersing the particles in the organic solvent; and providing the copper powder as dispersed copper cores that are absent a copper-oxide layer and have an organic coating, wherein the steps of dispersing in the etching solution, decanting, washing, disposing in the organic solvent, coating, and dispersing are performed in situ with the plurality of particles disposed in liquid, absent any exposure of the copper cores to air.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.