RF heating at selected power supply protocols
US9040879B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 5, 2013 |
| Grant date | May 26, 2015 |
| Priority date | — |
| Expiry date | May 29, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B40/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed is an apparatus for applying RF energy to an object in an energy application zone via one or more radiating elements at a plurality of modulation space elements (MSEs). The apparatus may include at least one processor configured to cause supply of RF energy to one or more of the radiating elements in a first subset of the plurality of MSEs, at a first power level common to the MSEs in the first subset and for varying time durations, and cause supply of RF energy to one or more of the radiating elements in a second subset of the plurality of MSEs, at power levels lower than the first power level and for a time duration common to the MSEs of the second subset.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.