Patent · US Active

Optical arrangement, in particular in a projection exposure apparatus for EUV lithography

US9041905B2 · kind B2 · utility

4Cited by

0References

28Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dirk Heinrich Ehm · Beckingen, DE
Stefan Schmidt · Aalen, DE
Guenther Dengel · Heidenheim, DE

Key dates

Filing date	Mar 7, 2012
Grant date	May 26, 2015
Priority date	—
Expiry date	Feb 6, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70983
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical arrangement, in particular in a projection exposure apparatus for EUV lithography. In an aspect an optical arrangement has a housing (100, 200, 550, 780) in which at least one optical element is arranged, and at least one subhousing (140, 240, 560, 790, 811, 823, 824, 831, 841) which is arranged within the housing and which surrounds at least one beam incident on the optical element in operation of the optical system, wherein the internal space of the subhousing is in communication with the external space of the subhousing by way of at least one opening, wherein provided in the region of the opening is at least one flow guide portion which deflects a flushing gas flow passing through the opening from the internal space to the external space of the subhousing, at least once in its direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.