Sulfonium salt and photo-acid generator
US9045398B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 29, 2014 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | May 29, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2602/42
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt.wherein R1 represents an electron withdrawing group; R2 and R3 each independently represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an acyl group, a halogenated alkyl group, a halogen atom, a hydroxyl group, a cyano group, or a nitro group; p and q each independently represent an integer of 0 to 5; and X−represents a monovalent counter anion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.