Nanoporous film patterned by direct photolithography and method for preparing the same
US9046784B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2013 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | Apr 27, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/26
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A nanoporous film patterned by direct photolithography and a method for preparing the same are provided. Since a precursor of the material is the mixture of a nano template material and a photoresist and the mixture still has the basic physical properties of the photoresist, a film is formed on a substrate by a standard photolithography process and a micro-sized patterned structure is realized. The mixture with the patterned structure is chemically etched to remove the template material to form a porous polymer film, or the mixture with the patterned structure is carbonized at a high temperature and then the template material is removed to form a porous carbon film. The nanoporous film patterned by direct photolithography and the method for preparing the same have the advantages of simple operation, low cost and good integration with other micro electric mechanical systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.