Non-halogenated etchant and method of manufacturing a display substrate using the non-halogenated etchant
US9048430B2 · kind B2 · utility
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23Claims
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Key dates
| Filing date | Dec 19, 2011 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | May 7, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K2102/103
Abstract
Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.