Effects of methods of manufacturing sputtering targets on characteristics of coatings
US9051211B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Apr 22, 2005 |
| Grant date | Jun 9, 2015 |
| Priority date | — |
| Expiry date | Aug 23, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/328
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Titanium and aluminum cathode targets are disclosed for sputtering absorbing coatings of titanium and aluminum-containing materials in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof, which can further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides, as well as metallic films. The titanium and aluminum-containing coatings can be utilized as an outer coat or as one or more coating layers of a coating stack.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.