Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device

US9052589B2 · kind B2 · utility

Assignee

• DOW GLOBAL TECHNOLOGIES LLC · US

Inventors

• John W. Kramer · Midland, US
• Daniel J. Arriola · Midland, US

Key dates

• Filing date: Aug 28, 2013
• Grant date: Jun 9, 2015
• Expiry date: Aug 28, 2033

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08F2438/03
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A polymer comprises the polymerized product of unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of the foregoing monomers, with a chain transfer agent of Formula (I);wherein in Formula (I), Z is a y valent C1-20 organic group, L is a heteroatom or a single bond, A1 and A2 are each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently C1-40 alkylene, C3-40 cycloalkylene, C6-40 arylene, or C7-40 aralkylene, and A1 contains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, X1 is a single bond, —O—, —S—, —C(═O)—O—, —O—C(═O)—, —O—C(═O)—O—, —C(═O)—NR—, —NR—C(═O)—, —NR—C(═O)—NR—, —S(═O)2—O—, —O—S(═O)2—O—, —NR—S(═O)2—, or —S(═O)2—NR, wherein R is H, C1-10 alkyl, C3-10 cycloalkyl or C6-10 aryl, Y− is an anionic group, G+ is a metallic or non-metallic cation, and y is an integer of 1 to 6. A photoresist composition comprising the polymer, a coated substrate, comprising a layer of the photoresist composition, and a method of forming an electronic device…