Patent · US Active

Doping an absorber layer of a photovoltaic device via diffusion from a window layer

US9054245B2 · kind B2 · utility

7Cited by
23References
19Claims
0Family size

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Key dates

Filing dateMar 2, 2012
Grant dateJun 9, 2015
Priority date
Expiry dateJul 10, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/543

Abstract

Methods for doping an absorbent layer of a p-n heterojunction in a thin film photovoltaic device are provided. The method can include depositing a window layer on a transparent substrate, where the window layer includes at least one dopant (e.g., copper). A p-n heterojunction can be formed on the window layer, with the p-n heterojunction including a photovoltaic material (e.g., cadmium telluride) in an absorber layer. The dopant can then be diffused from the window layer into the absorber layer (e.g., via annealing).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.