Laser induced thermal imaging mask, laser irradiation apparatus including the same, and method of manufacturing organic light emitting device by using the same
US9054314B2 · kind B2 · utility
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Key dates
| Filing date | Aug 31, 2011 |
| Grant date | Jun 9, 2015 |
| Priority date | — |
| Expiry date | May 31, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are a laser induced thermal imaging (LITI) mask, a laser irradiation apparatus including the LITI mask, and a method of manufacturing an organic light emitting device by using the LITI mask. The LITI mask including an opening corresponding to a pixel region and an opening corresponding to an edge of a pixel is used to form an organic layer in an upper portion of a substrate of an organic light emitting device, thereby transferring the organic layer to an edge of the pixel region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.