Self cleaning piezoelectric chemical apparatus and method of use
US9056338B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 19, 2013 |
| Grant date | Jun 16, 2015 |
| Priority date | — |
| Expiry date | Jul 19, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B7/026
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention is a piezoelectric self-cleaning apparatus, such as a chemical injection pump. The chemical injection pump is self-cleaning by employing either as an integral part or as an added part, a piezoelectric component that implosively cleans the pump head. This invention involves a liquid delivery system made of a liquid processing path and a piezoelectric actuator connected to or integral with said liquid processing path to enhance removal of unwanted solids from the liquid processing path or to maintain a blend, mix and/or integrity of a liquid chemical, wherein the liquid chemical does not precipitate particles, crystallize, separate or come out of solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.