Photopolymer formulation having ester-based writing monomers
US9057950B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2011 |
| Grant date | Jun 16, 2015 |
| Priority date | — |
| Expiry date | Sep 26, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/0065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photoinitiators, wherein the writing monomers comprise compounds of formula (I), where at least one of the radicals R1, R2, R3, R4, R5, R6 is a radical bonded to the aromatic ring via X of formula (II), where, in formula (II), A is a linear or branched hydrocarbon, optionally comprising oxygen or nitrogen, the remaining radicals R1, R2, R3, R4, R5, R6 are, independent of each other, hydrogen or an organic radical, and R7 is hydrogen or methyl. The invention further relates to the use of the photopolymer formulation for producing holographic media.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.