Thinner composition for RRC process, apparatus for supplying the same, and thinner composition for EBR process
US9057953B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Aug 30, 2012 |
| Grant date | Jun 16, 2015 |
| Priority date | — |
| Expiry date | Jun 14, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thinner composition for a reduced resist coating process includes an alkyl lactate, cyclohexanone, and an alkyl acetate, wherein an alkyl substituent of the alkyl acetate is a C1 to C5 non-ether based alkyl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.