Processing of insulators and semiconductors
US9059079B1 · kind B1 · utility
2Cited by
115References
21Claims
0Family size
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Inventors
Key dates
| Filing date | Sep 25, 2013 |
| Grant date | Jun 16, 2015 |
| Priority date | — |
| Expiry date | Sep 25, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/547
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method is disclosed for processing an insulator material or a semiconductor material. The method includes pulsing a plasma lamp onto the material to diffuse a doping substance into the material, to activate the doping substance in the material or to metallize a large area region of the material. The method may further include pulsing a laser onto a selected region of the material to diffuse a doping substance into the material, to activate the doping substance in the material or to metallize a selected region of the material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.